Glyclean™ eGA

Semiconductor Processing Applications

This semiconductor-grade glycolic acid is an environmentally friendly residue remover and surface preparation product designed for use in applications requiring low levels of metal impurities.

Glyclean eGA is an attractive building block with potential to enable formulations in many areas of semiconductor manufacture, including:

Wafer cleaning and surface preparation

  • Front-end-of-line (FEOL) and back-end-of-line (BEOL) cleaners
  • Post-etch residue removers/cleaners
  • Post photo-resist removal cleaners
  • Chemical Mechanical Planarization (CMP) slurry formulations
  • Post-CMP cleaners

Features and Benefits

Low corrosion rates, excellent metal ion chelation, and an efficient pH adjustment profile make Glyclean™ eGA an excellent choice for semiconductor manufacture. This acid has low toxicity and volatility for safety, handling, and ease of use.